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IC steppers and scanners, LCD steppers and scanners
The market for IC steppers and scanners will likely be tight during the first half of the year ending March 2009 due to weakening in the semiconductor market, but we expect the market for LCD steppers and scanners to pick up as expansion in the LCD television market drives a recovery in capital expenditure by LCD panel manufacturers.
Sales of Nikon Steppers and Scanners and Global Market Share
| Q1: | How were sales for the Precision Equipment Business? |
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| A1: | During the year ended March 2008, Nikon began global shipments of the NSR-S610C ArF immersion scanner, which has an NA value of 1.30 ("numerical aperture," the brightness of the projector lens). This model is the world's first scanner capable of mass production of semiconductors at 45 nm node and below, and has been shipped to all of the major regions of the world where leading-edge devices are manufactured. We also worked to expand sales of the NSR-S308F model of ArF scanners. Further, to strengthen product competitiveness we launched the NSR-SF150 scan field i-line stepper with vastly improved precision and throughput, as well as the NSR-SF155 model, based on the NSR-SF150 but with faster operating speed at the wafer stage. We also developed the NSR-S310F model, a cutting-edge ArF scanner capable of mass production of semiconductors of 65 nm or less, as well as the high productivity NSR-S210D KrF scanner. These models will be given a full-scale market launch in the year ending March 2009. In the LCD steppers and scanners field, we took steps to increase sales of existing models, such as the FX-83S compatible with 8th generation glass substrates, and began accepting orders for new models such as the FX-803M and FX-903N, which are ideal for high-definition, small to mid-sized LCD panels. |
| Q2: | What advanced technology is incorporated in Nikon's IC steppers and scanners? |
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| A2: | With the shift from NAND flash memory to DRAM and logic LSI, which use immersion as part of the production process, a considerable reduction in defects will be required. Nikon's ArF immersion scanners with Local Fill Nozzle have emerged as clearly superior in eliminating defects. The Local Fill Nozzle is an advanced design that helps to eliminate immersion-induced defects caused by bubbles, water spots, or particle contamination. The prevention of evaporation of immersion fluid and accompanying generation of vaporization heat also provides greater alignment accuracy. Local Fill Nozzle is also compatible with the topcoat-less resist (photoresist) process, reducing the number of processes and cutting manufacturing costs. Nikon's distinctive Tandem Stage improves productivity by separating the production process into two stages with different functions—Exposure and Calibration. This allows for high throughput and alignment accuracy, the two most crucial performance aspects in scanners. Nikon's scanners comprise highly independent modular units. This allows for stable, long-term operation, while also making maintenance significantly easier, and minimizing the time during the scanner is not working. Nikon is meeting these high level demands with superior technological capabilities that outstrip those of its competitors, and is seeking the leading market share for cutting-edge models of ArF immersion scanners. |
| Q3: | What are your strategies for lessening risk in the semiconductor market? |
| A3: | Attaining the leading market share for cutting-edge scanner models will demonstrate Nikon's technical capabilities. At the same time, we will enhance competitiveness for i-line steppers, KrF scanners for non-critical layers, in addition to cutting-edge ArF scanners including immersion-type in order to secure high earnings and a large market share. Securing the leading market share for high-end models will also lessen the risk of the silicon investment cycle, the market fluctuations peculiar to the semiconductor industry. It will provide a further benefit in terms of the cutbacks in capital expenditures by semiconductor makers, since the trend toward investment in cutting-edge models is likely to continue as manufacturers place priority on investment in device shrinkage to produce high-value-added semiconductors. |
| Q4: | What is Nikon doing to maintain its competitive advantage in LCD steppers and scanners? |
| A4: | The key to the market for LCD steppers and scanners is for the most part the trend toward larger LCD televisions. Manufacturing of panels 50 inches or larger will be more efficient using 10th generation large glass substrates. As LCD panels become larger, Nikon is able to develop and manufacture equipment that easily adapts to the larger glass substrates by using a multi-lens projection optical system. This system has allowed Nikon to capture a substantial share of the market for lithography equipment compatible with 7th and 8th generation substrates. This competitive advantage will not change with the progress to the next generation. |
| Q5: | What products is Nikon planning to introduce for the new "double patterning" technique？ |
| A5: | Double patterning is a technique to enhance resolution by dividing the exposure into two separate processes, and is increasingly looked to as the technology for mass production of semiconductors at 30 nm level node. The exposure requires a tighter alignment accuracy than with conventional techniques. Improvement in the throughput is also essential to maintain productivity with the double exposure. Nikon is currently developing an ArF immersion scanner for double patterning, the improved NSR-S610C model, with significantly enhanced alignment accuracy and faster stage operating speed to raise throughput. We plan to bring this new model to market in the year ending March 2009. As we develop this new technology, we are also looking to further reduce costs by utilizing a simplified design to minimize manufacturing time and effort by reviewing the production process, and have adopted a platform in which the modules are shared among models as much as possible. |
