Skip to sections.
December 13, 2004
On December 10, 2004, Nikon Corporation (Nikon), ASML Holding N.V. (ASML) and Carl Zeiss SMT AG (SMT) have executed definitive settlement and cross-license agreements related to lithography equipment used to manufacture semiconductor devices.
These agreements are based on the Memorandum of Understanding announced by the three companies on September 29, 2004, and accordingly, all stayed legal proceedings between the parties have been dismissed.
| Disclaimer | Back |
