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Nikon Announces New FX-21S Large-Plate Exposure SystemHigh Throughput Contributes to Increased Productivity for High Definition LCD Monitors

May 30, 2000

FX-21S

The Nikon Corporation (President : YOSHIDA, Shoichiro) has developed the FX-21S Large-Plate Exposure System and will start shipping for the new system on July 1, 2000.

The FX-21S forms an image of a mask pattern using a new multiple-lens projection optical system and exposes the pattern on a glass plate in a repeating step-and-scan process. The FX-21S system achieves efficient mass production of panels for 15- to 20-inch PC and TV liquid crystal monitors. These large monitors are fast becoming standard products, and the new FX-21S will enhance productivity in this crucial area.

Development Background

Thin film transistor (TFT) active matrix LCD technology was the key to the success of the notebook computer display market and now applications are found in desktop monitors. Since 15-inch panels are also being adopted for TV monitors and development is underway to use LCD panels in large wall-mounted TVs, the LCD market is expected to become even larger.

The new Nikon FX-21S Large-Plate Exposure System can easily produce LCD panels up to 30 inches wide. Compared to previous systems, the FX-21S realizes a dramatic improvement in throughput for the production of 15- to 20-inch panels, with a 1.7-fold increase in throughput for 15-inch panels, a 2.7-fold increase for 18-inch panels, and a 2.2-fold increase for 21-inch panels.

The FX-21S is optimally suited for the mass production of such large-monitor panels and will therefore contribute to improved productivity for TFT active matrix LCDs.

Main Features

Newly Developed Multiple-Lens Projection Optical System
The FX-21S has a new optical system made up of five projection lenses. This new system does not involve the step-and-repeat procedure of current steppers and enables 30-inch wide displays to be printed in a single scanning exposure.
Throughput Dramatically Improved
The new system has an enlarged exposure field that provides a dramatic improvement in throughput. The rate for 15- to 18-inch panels is 330 or more an hour, and for the large 20-inch panels it is 210 or more per hour.
Large Plate Applications
The FX-21S can handle plates as large as 800 x 950 mm2, the size SEMI (Semiconductor Equipment and Materials International) proposed for Generation 4 plates. This application makes it possible for a maximum of six 15- to 18-inch panels or four 22-inch panels to be made on one glass plate. It is also makes possible the production of very large displays up to 30-inches wide.
Wide Exposure Field and High Resolution Simultaneously Achieved
The FX-21S maintains the same high resolution of 2.4 micrometer or better (isolated pattern) as conventional steppers even though the new system's exposure field was enlarged to 400 x 700 mm. The new FX-21S is also fully capable of handing LCDs with even higher definition than previously.

Main Specifications

Resolution 2.4 micrometer or less (Isolated patterns),
3 micrometer or less (L / S)
Exposure Field 400 x 700 mm
Projection Magnification 1:1
Alignment Accuracy 0.6 micrometer or less (3 sigma)
Maximum Plate Size 800 x 950 mm2
Mask Size 500 x 750 mm

The export of this product is controlled by Japanese Foreign Exchange Trade Law and International export control regime. They shall not be exported without authorization from the appropriate governmental authorities. May 2000

The information is current as of the date of publication. It is subject to change without notice.

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