Employing phase Fresnel lenses developed using Nikon’s own optical technologies

Nikon Introduces CFI60-2 Objective Series for Industrial Microscopes

September 25, 2012

CFI60-2 objectives of the TU Plan EPI ELWD series

Nikon Corporation (Makoto Kimura, President; Tokyo) is pleased to announce the release of the CFI60-2 objective series for industrial microscopes on October 1, 2012, which further enhances the capabilities of chromatic-aberration reduction and long working distances (*1) compared with the CFI60 objective series.

  • *1Working distance (WD) refers to the distance from the tip of an objective to a subject, with the subject in focus. Long working distances offer various advantages such as preventing an objective from coming in contact with the subject when the objective is switched.

Product Information

Product name: Nikon CFI60-2 objective series for industrial microscopes

Objectives employing phase Fresnel lenses (*2)

Standard-type objectives

Availability: From October 1, 2012 (sequential sales start)

Background of Development

Industrial microscopes have been utilized for applications such as observation, examination, research, and analysis in a wide variety of fields including semiconductors, flat panel displays, electronic components, and various materials.
In these fields, a diverse range of samples is observed using various microscopic methods where both high optical performance and ease of operation are demanded.
To meet these demands, Nikon has developed the CFI60-2 objective series, which employs phase Fresnel lenses developed using Nikon’s own optical technologies to further improve the ease of operation attributed to the optical performance and long working distances, which are highly valued in the existing CFI60 objective series.

Key Features

[CFI60-2 objective series for industrial microscopes]

1. 1. Employing Nikon’s original phase Fresnel lenses(*2)

Phase Fresnel lenses developed using Nikon’s own optical technologies are used for the objectives of industrial microscopes. This enables chromatic aberration, which reduces contrast, to be accurately corrected at individual classes, resulting in sharper, clearer images. In addition, the lengthened working distances improve operability.

2. Improved basic performance of the standard-type objective series

For the standard-type TU Plan Fluor series objective (for bright-field, dark-field, differential interference, polarization, fluorescence), the performance of chromatic aberration for the middle range magnification (10X and 20X) has been improved, and the basic performance of the entire series has been increased. This makes it possible to obtain sharper, clearer images while maintaining the high NA and long working distances of the existing series.

3. Reduced weight

The weight of the 50X, 100X, and 150X high magnification objectives has been reduced by approximately 30% compared with existing products.
This has narrowed the weight differences with objectives of other magnification levels, reducing inconveniences in replacing the objectives.

4. Improved contrast by ultra-low magnification objectives

The T Plan EPI 1X and 2.5X objectives for ultra-low magnification and wide-field macro observation incorporate circularly polarizing plates and a depolarizer to suppress flare, which is induced when observing low reflectivity samples and which is specific to ultra-low magnification objectives, enabling sharper, clearer images to be observed. This makes it possible to eliminate existing potential problems that reduce contrast when an objective is attached to an OEM use microscope.

<Main Specifications of the CFI60-2 Objectives>

Application Name
(Type)
Magnification Numerical Aperture
(NA)
Working Distance
(WD) (mm)
Bright field T Plan EPI
Plan
(Semi-apochromat)
1X 0.03 3.8
2.5X 0.075 6.5
TU Plan Fluor EPI
Plan fluor
(Semi-apochromat)
5X 0.15 23.5
10X 0.30 17.5
20X 0.45 4.5
50X 0.8 1.0
100X 0.9 1.0
TU Plan Apo EPI
Plan apo
(Apochromat)
[Phase Fresnel lens type]
50X 0.8 2.0
100X 0.9 2.0
150X 0.9 1.5
Polarization TU Plan Fluor EPI P
Plan fluor for polarization
(Semi-apochromat)
5X 0.15 23.5
10X 0.30 17.5
20X 0.45 4.5
50X 0.8 1.0
100X 0.9 1.0
Bright-field
long working distance
TU Plan EPI ELWD
Long working distance plan
(Semi-apochromat)
[Phase Fresnel lens type]
20X 0.4 19.0
50X 0.6 11.0
100X 0.8 4.5
Bright-field
super long working distance
T Plan EPI SLWD
Super long working distance plan
(Semi-apochromat)
[Phase Fresnel lens type]
10X 0.2 37.0
20X 0.3 30.0
50X 0.4 22.0
100X 0.6 10.0
Bright/dark field TU Plan Fluor BD
Plan fluor
(Semi-apochromat)
5X 0.15 18.0
10X 0.3 15.0
20X 0.45 4.5
50X 0.8 1.0
100X 0.9 1.0
TU Plan Apo BD
Plan apo
(Apochromat)
[Phase Fresnel lens type]
50X 0.8 2.0
100X 0.9 2.0
150X 0.9 1.5
Bright/dark-field
long working distance
TU Plan BD ELWD Long working distance plan (Semi-apochromat) [Phase Fresnel lens type] 20X 0.4 19.0
50X 0.6 11.0
100X 0.8 4.5

This information is current as of the date of publication. It is subject to change without notice.