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New solution from Nikon: An ideal new microscope
Employs internal turrets that keep dust off the illumination filters, maintaining bright uniform illumination. Also, the power supply is built in to save space.
The observation position of the objective lens and sample can be checked easily from the microscope’s front panel.
Links the attachment/release of the analyzer/polarizer.
The field stop and aperture stop automatically open when switched from brightfield to darkfield. When returning to brightfield observation, the previous field and aperture stop settings are reproduced.
Automatically prevents reflection flashes when switching objective lenses
A box shaped microscope, in which not only the width but also the depth is reduced dramatically: The footprint is only one-third of a conventional model!
Vibration during high-power observation is reduced. Extremely high rigidity.
The ultra wide field of view eyepiece, in combination with the newly developed 1x objective lens, enables a sample of 25 mm in diameter to be observed in one field of view.
Nikon’s world-class CFI60 optics provide clear, high-contrast brightfield images and darkfield images with three times the brightness of conventional models. New 1x and 40x objective lenses have been added to the line up.
Improved uniformity of illumination delivers clear images, especially for digital imaging
The 50W halogen light source realizes the same brightness as the previous 100W light source with only about half the power consumption.
The built-in, high-definition, large 8.4-inch XGA LCD screen lets you view & discuss the sample without the need to look in the eyepieces.
Captured images can be saved to USB memory or a CF card. In addition to printing directly via a PictBridge-compatible printer, you can save data onto a server over a LAN.
The calibration data is automatically changed when the objective magnification is changed. This feature makes it easy to use the measurement function in the DS-L2. Quantitative illumination adjustment can be made manually by viewing the voltage value. This is crucial when acquiring the optimum settings for observation and image capture.
DS-U2 and NIS-Elements allow the user to perform everything from basic image capture to the measurement, analysis, and management of captured images.
*See the NIS-Elements catalog for more information.
The calibration data is automatically changed when the objective magnification is changed. This feature makes the measurement function and other optional software modules such as grain sizing and cast iron analysis in the NIS-Elements easy to use.
Quantitative illumination adjustment, which is crucial when acquiring the optimum settings for observation, image capture and especially large image stitching, can be made via PC control.
Adjacent images can be put together to create an image with a wide field. It is now possible to capture even more vivid images due to the improved uniformity of the illumination.
Detects and measures grains in one and two phase samples according to JIS G0551 or ASTM E112-96/E1382-97 standards.
Detects, measures and classifies graphite content as well as ferrite content in graphite-corrected samples according to JIS G5502 or ASTM A247-06 standards.
