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Booth

SEMICON Japan 2006
Nov. 28, 2006

Our concept of "Total output" (productivity improvement) strongly supports the semiconductor manufacturing line

Nikon exhibited in Hall 3, around which a group of front-end-related manufacturers exhibited, including a booth for photolithography process-related manufacturers. Nikon's booth was at the end of Hall 3, 3C-1101. We presented various products under the theme, "Total Output."

Defining The Next Generation
  • Please check "Product Outlines" for details about exhibited products.
  • In the VTR theater,
    "NSR-S610C: The ArF immersion scanner boasts of the world's highest NA of 1.30" and "NSR-SF150: The Step-and Repeat Scanning System configured with sky-hook structure and light-weight wafer stage to achieve substantially reduced vibration and fastest possible stage transfer"
    were shown continuously.



© 2008 Nikon Corporation