|
| FX-21S/22S |
| |
FX-21S |
FX-22S |
| Resolution |
2.4µm or better (isolated pattern), 3µm or better (L/S) |
| Projection magnification |
1:1 |
| Exposure field |
400 x 700mm |
400 x 714mm |
| Alignment accuracy |
0.6µm or better (3σ) |
Maximum plate size
|
800 x 950mm |
920 x 920mm |
| Mask size |
500 x 750mm |
|
| FX-702J |
| Resolution (1µm-thick positive-resist) |
1.5µm or better (L/S), 2.0µm or better (C/H) |
| Projection magnification |
1:1 |
| Exposure field |
100mm square ~ 74.83 x 120mm (ø141.42mm) |
| Reticle size |
6-in. |
| Maximum plate size |
600 (X) x 720 (Y)mm |
Alignment accuracy
|
0.32µm or better  |
| Options |
Pellicle particle detector, extended reticle library, reticle bar code reader, remote control system (RCS) |
|
| |
|
| FX-701M |
| Resolution (1µm-thick positive-resist) |
2.4µm (isolated pattern), 3µm (L/S) |
| Projection magnification |
1:1.25 |
| Exposure field |
132mm square ~ 105.87 (H) x 153.75 (V)mm (ø186.68mm) |
| Reticle size |
6-in. square |
| Maximum plate size |
600 (X) x 720 (Y)mm2 |
Alignment accuracy
|
0.5µm  |
| Options |
Pellicle particle detector, extended reticle library, six-reticle multichanger, bar-code reader, plate edge exposure function, etc. |
|
| |
|
| FX-601F |
| Resolution (1µm-thick positive-resist) |
2.4µm or better (isolated pattern), 3µm or better (L/S) |
| Projection magnification |
1:1.25 |
| Exposure field |
120mm square ~ 98.78(H) x 138(V)mm (ø169.71mm) |
| Reticle size |
6-in. square |
| Maximum plate size |
550 x 650mm |
Alignment accuracy
|
0.5µm or better (EGA,  ) |
|
