The ArF scanner NSR-S305B brings high throughput to 300mm wafer volume production lines. The high NA projection lens provides support for 110nm lithography.
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| Resolution |
110nm or better |
| NA |
0.68 |
| Exposure light source |
ArF excimer laser (193nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
25×33mm |
Alignment accuracy 
|
30nm or better |
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