The ArF scanner NSR-S306C delivers high throughput to 300mm wafer volume production lines. Equipped with a high NA lens, the NSR-S306C enables 100nm lithography.
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| Resolution |
100nm or better |
| NA |
0.78 |
| Exposure light source |
ArF excimer laser (193nm wavelength) |
| Reduction ratio |
1:4 |
| Exposure field |
25×33mm |
Alignment accuracy 
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20nm or better |
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Leaflet (255KB)