ArF Scanner NSR-S310F
The NSR-S310F ArF scanner employs an acclaimed tandem stage to improve throughput by 20% over conventional models, delivering 174 wafers (300 mm) per hour. The new scanner’s 7 nm or better alignment accuracy, Nikon’s field-proven projection optics (NA 0.92) and illumination system, coupled with POLANO polarization control system and optional infrared aberration control (IAC), combine to provide exceptional imaging performance. The NSR-S310F greatly reduces CoO (Cost of Ownership) in the mass production of 65 nm or smaller devices. The use of a platform common to all Nikon scanners contributes to improving production efficiency and cutting running costs.
| Resolution | ≦ 65 nm |
|---|---|
| NA | 0.92 |
| Light source | ArF excimer laser (193 nm wavelength) |
| Projection magnification | 1:4 |
| Maximum exposure field | 26 × 33 mm |
| Overlay | ≦ 7 nm |
| Throughput | ≧ 174 wafers/hour (300 mm wafer, 76 shots) |
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