The NSR-S310F ArF scanner employs an acclaimed tandem stage to improve throughput by 20% over conventional models, delivering 174 wafers (300mm) per hour. The new scanner’s 7nm or better alignment accuracy, Nikon’s field-proven projection optics (NA 0.92) and illumination system, coupled with POLANO polarization control system and optional infrared aberration control (IAC), combine to provide exceptional imaging performance. The NSR-S310F greatly reduces CoO (Cost of Ownership) in the mass production of 65nm or smaller devices. The use of a platform common to all Nikon scanners contributes to improving production efficiency and cutting running costs.
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| Resolution |
65nm or better |
| NA |
0.92 |
| Light source |
ArF excimer laser (wavelength: 193nm) |
| Projection magnification |
1:4 |
| Maximum exposure field |
26×33mm |
Alignment accuracy
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7.0nm or better |
| Throughput |
174 or more wafers (300mm) per hour |
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Leaflet (237KB)