i-line Stepper NSR-2205i14E2
The NSR-2205i14E2 with a projection lens offers a peak NA of 0.63 and achieves a resolution of 350 nm or better. Through modified illumination, it allows optimization of various processing conditions for 256M DRAM mass production.
| Resolution | ≦ 350 nm |
|---|---|
| NA | 0.63 |
| Exposure light source | i-line (365 nm wavelength) |
| Reduction ratio | 1:5 |
| Exposure field | 22 mm square to 17.9 (H) × 25.2 (V) mm |
| Overlay | ≦ 40 nm |
| Throughput | ≧ 103 wafers/hour (200 mm wafer) |
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