In order to take advantage of the high mix-and-match performance potential of our DUV excimer steppers, Nikon has developed the NSR-SF100 i-line field scan stepper. This system features an exposure field and a reticle reduction ratio matching the specifications of the lens-scanning steppers. Furthermore, it offers high resolution, high precision and high throughput, and will drastically improve productivity, while also reducing total production line investment costs.
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| Resolution |
400nm or better |
| NA |
0.52 |
| Exposure light source |
i-line (365nm) |
| Reduction ratio |
1:4 |
| Exposure field |
25×33mm |
Alignment accuracy
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45nm or better  |
| Throughput |
200mm wafers: 120 or more wafers/hour,
300mm wafers: 80 or more wafers/hour |
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Leaflet (272KB)