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NSR-SF150

The NSR-SF150 i-line scan field stepper utilizes an innovative “Sky-hook” structure platform in which the projection lens is suspended to dramatically reduce vibration, and a lightweight wafer stage to increase stage movement. Coupled with increased alignment accuracy, this system delivers a throughput of 180 or more wafers (300mm) per hour.

  NSR-SF150
Resolution 280nm or better
NA 0.62
Exposure light source i-line (365nm wavelength)
Reduction ratio 1:4
Exposure field 26×33mm
Alignment accuracy
25nm or better
Throughput 300mm wafers: 180 or more wafers/hour
   
     
Skyhook mechanism    
Skyhook mechanism    
 
PDF Leaflet (251KB)



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