NSR-SF155
The NSR-SF155 i-line scan field stepper delivers powerful performance for non-critical layers in mass production of next-generation memory and microprocessors. Like the SF150, the NSR-SF155 utilizes Skyhook Technology, which enables the projection lens to be suspended from the body and away from the floor, greatly reducing vibration levels. Furthermore, the NSR-SF155 boasts increased wafer stage speed and improved chamber temperature stability through heat countermeasures. The NSR-SF155 delivers a throughput of 200 wafers or more per hour for 300 mm wafers. Moreover, the new system allows NSR-SF150 units already in use on production lines to be upgraded to the NSR-SF155.
| Resolution | ≦ 280 nm |
|---|---|
| NA | 0.62 |
| Exposure light source | i-line (wavelength 365 nm) |
| Reduction ratio | 1:4 |
| Exposure field | 26 × 33 mm |
| Overlay | |M| + 3σ ≦ 25 nm |
| Throughput | 300 mm wafers: 200 or more wafers (exposure dose 200 mj/cm2) |
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