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NSR-SF155

The NSR-SF155 i-line scan field stepper delivers powerful performance for non-critical layers in mass production of next-generation memory and microprocessors. Like the SF150, the NSR-SF155 utilizes Skyhook Technology, which enables the projection lens to be suspended from the body and away from the floor, greatly reducing vibration levels. Furthermore, the NSR-SF155 boasts increased wafer stage speed and improved chamber temperature stability through heat countermeasures. The NSR-SF155 delivers a throughput of 200 wafers or more per hour for 300 mm wafers. Moreover, the new system allows NSR-SF150 units already in use on production lines to be upgraded to the NSR-SF155.

  NSR-SF155
Resolution 280nm or better
NA 0.62
Exposure light source i-line (wavelength 365 nm)
Reduction ratio 1:4
Exposure field 26×33mm
Alignment accuracy
25nm or better
Throughput 300mm wafers: 200 or more wafers (exposure dose 200 mj/cm2)
   
 
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