ArF Immersion Scanner NSR-S620D
The NSR-S620D incorporates three newly developed technologies — Bird's Eye Control, Stream Alignment, and the Modular2 Structure — to make it the optimal immersion scanner for double patterning. The NSR-S620D design builds upon the unique Tandem Stage and local fill technologies employed in the Nikon NSR-S610C, the world's first ArF immersion scanner for 45 nm node volume production.
| Resolution | ≦ 38 nm |
|---|---|
| NA | 1.35 |
| Exposure light source | ArF excimer laser (193 nm wavelength) |
| Reduction ratio | 1:4 |
| Maximum exposure field | 26 mm × 33 mm |
| Overlay | ≦ 3 nm |
| Throughput | ≧ 180 wafers/hour (300 mm wafer, 125 shots) |
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