ArF Immersion Scanner NSR-S621D
The NSR-S621D builds upon the well-known Streamlign platform and incorporates further hardware and software developments to deliver industry-leading overlay accuracy and throughput, as well as exceptional system stability and matching capabilities. The advanced NSR-S621D immersion scanner fully satisfies the aggressive high-volume requirements of 20 nm technology and beyond.
| Resolution | ≦ 38 nm |
|---|---|
| NA | 1.35 |
| Exposure light source | ArF excimer laser (193 nm wavelength) |
| Reduction ratio | 1:4 |
| Maximum exposure field | 26 mm × 33 mm |
| Overlay | ≦ 2 nm |
| Throughput | ≧ 200 wafers/hour (300 mm wafer, 125 shots) |
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