KrF Scanner NSR-S210D
The NSR-S210D KrF scanner employs an acclaimed tandem stage to improve throughput by 20% over conventional models, delivering 176 wafers (300 mm) per hour. The new scanner’s 9 nm or better alignment accuracy combines with Nikon’s field-proven projection optics (NA 0.82) and illumination system to provide exceptional imaging performance. The NSR-S210D greatly reduces CoO (Cost of Ownership) in the mass production of 110 nm or smaller devices. The use of a platform common to all Nikon scanners contributes to improving production efficiency and cutting running costs.
| Resolution | ≦ 110 nm |
|---|---|
| NA | 0.82 |
| Light source | KrF excimer laser (248 nm wavelength) |
| Projection magnification | 1:4 |
| Maximum exposure field | 26 × 33 mm |
| Overlay | ≦ 9 nm |
| Throughput | ≧ 176 wafers/hour (300 mm wafer, 76 shots) |
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