The NSR-S210D KrF scanner employs an acclaimed tandem stage to improve throughput by 20% over conventional models, delivering 176 wafers (300mm) per hour. The new scanner’s 9nm or better alignment accuracy combines with Nikon’s field-proven projection optics (NA 0.82) and illumination system to provide exceptional imaging performance. The NSR-S210D greatly reduces CoO (Cost of Ownership) in the mass production of 110nm or smaller devices. The use of a platform common to all Nikon scanners contributes to improving production efficiency and cutting running costs.
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| Resolution |
110nm or better |
| NA |
0.82 |
| Light source |
KrF excimer laser (wavelength: 248 nm) |
| Projection magnification |
1:4 |
| Maximum exposure field |
26×33mm |
Alignment accuracy
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9.0nm or better |
| Throughput |
176 or more wafers (300mm) per hour |
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Leaflet (238KB)