Skip to sections.

Nikon
Global
Search This Site

Nikon's ultra-precision technology, creating state-of-the-art IC and LCD

Integrated circuits (IC) and liquid crystal display (LCD) panels are the key devices driving the continued growth in the field of information technology. Nikon's NSR-series IC steppers and FX-series LCD steppers bolster the development and progress of ICs and LCDs through light and precision nanotechnology.
 
The continuing evolution of NSR-series steppers
 
Nikon NSR-1010GSince we started developing semiconductor manufacturing equipment in the mid 1970's, Nikon has been actively involved in the harnessing of new semiconductor-related technologies. In 1976, as requested by a government VLSI (Very Large-Scale Integration) research group, Nikon began development of a stepper known as the SR-1, and completed it in 1978. Two years later, Nikon proudly announced it had finished development of the first step-and-repeat scanner made entirely in Japan -- the NSR-1010G.

In order to proceed with the development of the stepper -- the single most important machine in the IC manufacturing process -- we had to negotiate numerous obstacles, including the development of extremely high-performance optical lenses and ultra-precision mechanical drives. We also dealt with issues like precision system control, high throughput and superior durability.

The NSR-1010G represents the convergence of a variety of Nikon's highly advanced technologies. We integrated our optical glass and lens production capabilities with precision fabrication and measurement technologies, and created the stepper -- recognized as "the most precise machine ever made." And this was merely the beginning. Since the first NSR-series stepper was born, we have performed extensive R&D in stepper technology, refined our knowledge and understanding of nanotechnology, and supported the rapidly shrinking geometries of IC manufacturing.

To this point we have produced over 40 models of NSR-series steppers, making it a comprehensive lineup ready to meet the diverse requirements of the semiconductor manufacturing industry -- from the development of state-of-the-art ICs to cost-efficient mass production.

Today, the Nikon Precision Company operates R&D, manufacturing, sales and service facilities totaling approximately 70, located primarily in Japan, North America, Europe and Asia. As a top supplier of steppers, the Precision Company consistently delivers timely, expert service and support based on our commitment to close working relationships with customers. We are also working to increase the productivity of all of our fab lines the world over.
 
Revolutionary technologies that define the NSR series
 
Nikon has developed and implemented an impressive range of innovative stepper technologies in the NSR series. Here are a few examples, each accompanied by a brief explanation:

  • Lens-scanning stepper design
    To expand the stepper exposure field and enable the production of larger, more advanced devices, we developed the lens-scanning system, where the stages on which the reticle (mask) and wafer are mounted are moved simultaneously during exposure.

  • High-NA projection lenses
    N.A. stands for "numeric aperture". This term indicates the brightness of the lens, and is a key determinant in stepper resolution. The new NSR-S307E lens-scanning stepper incorporates a projection lens with the highest N.A. in the world, helping make possible the mass production of 80nm devices.

  • Development of new light sources
    The shorter the wavelength of the exposure light source, the finer the pattern that can be produced. Stepper light source wavelengths have steadily decreased -- from g-line to h-line to i-line UV frequencies. Today, KrF and ArF excimer laser light sources are widely employed in steppers to allow the production of even more precise, advanced ICs.

  • Phase shift
    This technology employs special reticles (masks) for IC exposure which enhance resolution. Lens-scanning steppers using ArF excimer laser light sources can apply phase-shift technology to achieve the production of advanced ICs with line widths as small as 90 nanometers.

  • Mix-and-match techniques take advantage of strong points of batch scan-field steppers and high-end lens-scanning steppers
    In the IC manufacturing industry, the term mix-and-match is used to refer to a manufacturing technique in which excimer laser lens-scanning steppers are used in the exposure of critical layers where resolution is paramount, and high-productivity batch step-and-scan steppers are used to expose the non-critical layers. The mix-and-match scheme marks the achievement of balance between high quality and cost-efficiency in IC manufacture.

NSR-S308F Stepper (development announced in April 2004)As the demands of IC development and production have become more complex, Nikon has been relentless in its technological innovation. A recent example is the NSR-S307E ArF excimer laser stepper, a relative of the groundbreaking NSR-S201A, released in 1995. Featuring the highest resolution in the world at 80nm or better, the NSR-S307E is more than ready to tackle the production of next-generation 90nm design-rule devices.

The knowledge gained in the development of these advanced steppers is applied also to the production of conventional steppers, allowing us to offer even higher performance. The NSR-S207D KrF excimer laser stepper, our newest lens-scanning stepper, offers a resolution of 110 nm or better. Nikon's engineers constantly create new equipment to augment the already-impressive lineup of semiconductor lithography systems, in response to the requirements of the rapidly evolving IC manufacturing industry. We offer lens performance and total output levels that no one in the field can match.

The Nikon Precision Company was also one of the first firms to begin development of next-generation lithography technologies, the key to developing and manufacturing the ICs of tomorrow. Our experience and involvement are exemplified by our participation in the Asuka Project, directed toward the successful development and implementation of an electron beam-based projection lithography system. To that end, Nikon has delivered its first electron beam (EB) stepper to Selete (Semiconductor Leading Edge Technologies Inc.) Corporation for use in the development of advanced 65nm ICs. Nikon is also engaged in R&D of technologies such as immersion ArF, flourine (F2) and extreme ultra-violet (EUV).

Note: Details on these newer technologies will become available in future editions of this stepper technology column.
 
FX-series LCD steppers and more
 
Nikon FX-801M LCD Stepper SystemNikon developed and sold its first LCD steppers in 1986. From that time forward, we have been very active in this field which today is attracting considerable attention. LCD panels are now employed in products such as large-screen televisions, notebook PCs and mobile telephones.

What began with the release of the NSR-L7501G has become a deep lineup featuring step-and-scan and stepper-type exposure systems. From large plate sizes to the production of color filters and low-temperature polysilicon TFT displays, Nikon's FX series of LCD steppers are up to the task, and are contributing to the higher performance we will see in the large-screen, high-definition displays of tomorrow.

We also offer a lineup of high-resolution steppers designed for the production of magnetic heads, based on our popular NSR series of IC steppers. Magnetic heads are essential in enhancing the memory of hard disk drives.
 
Other IC/LCD manufacturing equipment
In addition to the IC and LCD steppers manufactured by the Nikon Precision Company, the Nikon Group offers a broad array of machinery and tools for IC and LCD manufacture. We support the growth of the industry not only through the development of precision steppers, but also by supplying quality products to other manufacturers in the field.

In IC manufacturing:
CMP systems (Nikon Corporation, CMP Business Group)
Overlay aligners, automatic macroinspection systems, CNC image measurement systems, external wafer inspection systems, automatic IC inspection microscopes, high-definition digital cameras for photomicroscopy, wafer carrier measurement systems (Nikon Instech)
Lithographic information management systems, process data operation support systems (Nikon Systems Corporation)

In LCD manufacturing:
Inspection systems for large-size LCD sheets (Nikon Instech)



© 2008 Nikon Corporation