Nikon optical materials have been developed to respond to light sources for semiconductor and FPD lithography systems, for which high accuracy and durability are required. Through evaluation of physical properties, by the latest analysis and measurement technologies, we guarantee specification properties, grades and production quality that meet the needs of our customers.
Synthetic Silica Glass (NIFS Series)
We provide materials with specifications that meet the application needs, from materials that provide superior laser durability and high transmittance in the vacuum ultraviolet region to materials for use in the visible region.
Calcium Fluoride (NICF Series)
Having reduced impurity to the utmost limit, we provide materials with specifications that meet the application needs, from single crystal materials that realize superior laser durability in the vacuum ultraviolet region to materials for use in the visible/infrared regions.
With almost 100 years of development for high-quality optical materials, Nikon has developed its own unique range of i-line glass materials for a wide range of applications.