Lineup

Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

Lithography Systems

ArF Immersion Scanners

Resolution ≦ 38 nm
NA 1.35
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 1.5 nm, MMO*2: ≦ 2.1 nm
Throughput ≧ 275 wafers/hour (96 shots)
Resolution ≦ 38 nm
NA 1.35
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 2 nm, MMO*2: ≦ 3.5 nm
Throughput ≧ 200 wafers/hour (125 shots)

ArF Scanners

Resolution ≦ 65 nm
NA 0.92
Exposure light source ArF excimer laser (193 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 2 nm, MMO*2: ≦ 5 nm
Throughput ≧ 230 wafers/hour (96 shots)

KrF Scanners

Resolution ≦ 110 nm
NA 0.82
Exposure light source KrF excimer laser (248 nm wavelength)
Reduction ratio 1:4
Maximum exposure field 26 mm × 33 mm
Overlay SMO*1: ≦ 3 nm, MMO*2: ≦ 6 nm
Throughput ≧ 230 wafers/hour (96 shots)

i-line Steppers

Resolution ≦ 280 nm
NA 0.62
Exposure light source i-line (365 nm wavelength)
Reduction ratio 1:4
Exposure field 26 mm × 33 mm
Overlay ≦ 25 nm
Throughput ≧ 200 wafers/hour (76 shots)

Alignment Stations

Litho Booster

Litho Booster is an advanced Alignment Station that leverages proprietary Nikon technologies developed for semiconductor lithography systems. Absolute grid distortion values are measured quickly with ultra-high precision for all wafers prior to exposure. Correction values are then fed forward to the lithography system to greatly improve overlay accuracy without reducing throughput, contributing to enhanced yield and optimized equipment investments.

Metrology/Inspection Systems

Automatic Macro Inspection System AMI-5600/3500/3000 MarkⅡ

The AMI makes both high throughput and exceptional detection sensitivity very achievable. It provides improved macro inspection accuracy, as well as greater inspection quantization and clarity, allowing more efficient process management.

Wafer Inspection System OPTISTATION-3200/3100/3000

The OPTISTATION is a wafer inspection system that enables simple and speedy manual visual inspection of 300 mm wafers. It contributes to dramatic increases in yields as an inline inspection system and analysis tool for R&D defect analysis.

Illumination System for Image Sensor Inspection N-SIS9/8

The N-SIS9/8 is an illumination system specialized for image sensor inspection. The system provides high-power, highly uniform illumination over a large inspection field, enabling high-speed illuminance setting and high-speed spectral settings including RGB.

All of the products on this page are under export restriction. The export of these products is controlled by Japanese Foreign Exchange and Foreign Trade Law and International export control regimes. They shall not be exported without authorization from the appropriate governmental authorities. (Excluding semiconductor inspection equipment)